Original Papers- GOTO Takashi -
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701.Tungsten-bronze Ba2NaNb5O15 and layer-structured Bi4Ti3O12 ferroelectric thin films.[Proc. 6th US-Japan Seminar on Dielectric and Piezoelectric Ceramics, Ed. by A. Safari, Hawaii, 1993,(1993),55-58]Y. Masuda, H. Masumoto, A. Baba, T. Goto, T. Hirai
702.Prepation of Iridium and Platinum films by MOCVD and their properties.[Journal de Physique, IV.,C3(3),(1993),297-304]T. Goto, R. Vargas, T. Hirai
703.Non-Stoichiometry of Titanium Nitride Plates Prepared by Chemical Vapour Deposition.[Journal of Alloys and Compounds,190,(1993),197-200]JIANG C.C., GOTO T., HIRAI T.
704.Preparation of SiC-W[2]C Nano-Composite Powders by Chemical Vapour Deposition of the SiH[4]-CH[4]-WF[6]-H[2] System.[Journal of Materials Science,28,(1993),5543-5547]CHEN L., GOTO T., HIRAI T.
705.Deposition Rates of Titanium Nitride Plates Prepared by Chemical Vapour Deposition of TiCl[4]+NH[3] System.[Journal of Materials Science,28,(1993),6446-6449]JIANG C.C., GOTO T., HIRAI T.
706.Preparation of Ba[2]NaNb[5]O[15] Film by RF Magnetron Sputtering Method.[Japanese Journal of Applied Physics,32,(1993),4043-4047]MASUDA Y., MASUMOTO H., BABA A., GOTO T., HIRAI T.
707.High-Temperature Active Oxidation of Chemically Vapor-Deposited Silicon-Carbide in Co-Co2 Atmosphere.[Journal of the American Ceramic Society,76,(1993),2521-2524]Narushima T., Goto T., Yokoyama Y., Iguchi Y., Hirai T.,
708.High-temperature oxidation of CVD-SiC in CO-CO2 atmosphere.["High Temperature Corrosion of Advanced Mater. and Protective Coatings", Ed. by Y.Saito, B. Onay and T. Maruyama,(1992),345-350]T. Narushima, T. Goto, Y. Iguchi, T. Hirai
709.High-temperature active oxidation of CVD-Si3N4 in Ar-O2 atmosphere.[Solid State Ionics,53-56,(1992),256-259]T. Narushima, Y. Iguchi, T. Goto, T. Hirai, Y. Yokoyama
710.Preparation and optical properties of bismuth titanate films by ECR plasma sputtering.[J. Jpn. Soc. Powd. and Powd. Metallurgy,39(2),(1992),109-112]H. Masumoto, T. Goto, Y. Masuda, A. Baba, T. Hirai
711.Thermoelectric properties of Si-Ti-B in situ composito plates prepared by chemical vapor deposition.[Mater. Manu. Process,7(4),(1992),625-647]M. Mukaida, T. Goto, T. Hirai
712.ECRプラズマスパッタリング法によるチタン酸ビスマス膜の作製と光学特性.[粉体および粉末冶金,39,109-112,(1992)]GOTO Takashi, et al.
713.Coating of titanium carbide films on stainless steel by chemical vapour deposition and their corrosion behavior in a Br2-O2-Ar atmosphere.[J. Mater. Sci.,27(1),(1992),233-239]T. Goto, C. Y. Guo, H. Takeya, T. Hirai
714.Epitaxial growth of Bi4Ti3O12 films by electron cyclotron resonance plasma sputtering.[Proc. 36th Jpn. Congress Mater. Res.,(1992),129-132]H. Masumoto, T. Goto, Y. Masuda, A. Baba, T. Hirai
715.Preparation of superconducting oxide films by electron cyclotron resonance plasma sputtering and thermal chemical vapor deposition.[Chemical Designing and Proc. of High Tc Supercond., "Rep. Sci. Res. on Priority Area Ministry of Education", Ed. by Kazuo Fueki,(1992),171-176]T. Hirai, H. Yamane, H. Masumoto, T. Goto, M. Omori, K. Watanabe, N. Kobayashi
716.Characteristics and evaluation of oxide mixed conductors.[溶接学会誌,61,(1992),66-67]T. Goto
717.Crystal Growth, Dielectric and Polarization Reversal Properties of Bi[4]Ti[3]O[12] Single Crystal.[Japanese Journal of Applied Physics,31,(1992),3108-3112]Masuda Y., Masumoto H., Baba A., Goto T., Hirai T.
718.Coating of Titanium Carbide Films on Stainless Steel by Chemical Vapor Deposition and Their Corrosion Behavior in a Br[2]-O[2]-Ar Atmosphere.[Journal of Materials Science,27,(1992),233-239]Goto T., Guo C.Y., Takeya H., Hirai T.
719.Preferred Orientation of AlN Plates Prepared by Chemical Vapor Deposition of AlCl[3] + NH[3] System.[Journal of Materials Science,27,(1992),247-254]Goto T., Jun T., Kaya K., Hirai T.
720.Preparation of SiB[4+-x] and SiB[6] Plates by Chemical Vapour Deposition of SiCl[4] + B[2]H[6] System.[Journal of Materials Science,27,(1992),255-262]Mukaida M., Goto T., Hirai T.
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