Original Papers- GOTO Takashi -
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301.Deposition of α-Al2O3 films on Ti(C, N)-based cermet substrate by laser chemical vapor deposition using a diode laser.[Journal of the Ceramics Society of Japan,119,(2011),570-572]Y. You, A. Ito, R. Tu, T. Goto
302.High-speed epitaxial growth of (100)-oriented CeO2 film on r-cut sapphire by laser chemical vapor deposition.[Surface and Coatings Technology,205(16),(2011),4079-4082]Pei Zhao, Akihiko Ito, Rong Tu, Takashi Goto
303.Laser chemical vapor deposition of TiN film on Ti(C, N)-based cermet substrate using Ti(OiPr)2(dpm)2-NH3 system.[Journal of the Ceramics Society of Japan,199(4),(2011),310-313]Yu You, Akihiko Ito, Rong Tu and Takashi Goto
304.Catalytic materials prepared by chemical vapor deposition.[IOPConf. Series: Materials Science and Engineering (IOP Publishing),20,(2011),012001-]J. R. Vargas-Garcia, T. Goto
305.Fabrication of Transparent Lutetium Oxide by Spark Plasma Sintering.[Journal of the American Ceramic Society,94(3),(2011),695-698]L. An, A. Ito, T. Goto
306.Effect of time on microstructure and hardness of βSiAlON-cubic boron nitride composites during spark plasma sintering.[Ceramics International,37(2),(2011),521-524]M. Hotta, T. Goto
307.Fast epitaxial growth of a-axis- and c-axis-oriented YBa2Cu3O7-δ films on (100) LaAlO3 substrate by laser chemical vapor deposition.[Applied Surface Science,257(9),(2011),4317-4320]P. Zhao, A. Ito, R. Tu, T. Goto
308.Frequency-dependent electrical properties of ferroelectric BaTi2O5 single crystal.[Journal of Applied Physics,109(2),(2011),024107-]N. Maso, X.Y. Yue, T. Goto, A. R. West
309.Preparation of carbon nanotube by rotary CVD on Ni nano-particle precipitated cBN using nickelocene as a precursor.[Materials Letters,65(2),(2011),367-370]J.F. Zhang, R. Tu, T. Goto
310.Highly transparent lutetium titanium oxide produced by spark plasma sintenng.[Journal of the European Ceramic Society,31(1-2),(2011),237-240]L. An, A. Ito, T. Goto
311.Eggshell- and fur-like microstructures of yttrium silicate film prepared by laser chemical vapor deposition.[Materials Chemistry and Physics,125(1-2),(2011),242-246]A. Ito, J. Endo, T. Kimura, T. Goto
312.Dome-like and dense SiC-SiO2 nanocomposite films synthesized by laser chemical vapor deposition using CO2 laser.[Surface and Coatings Technology,205(8-9),(2011),2818-2822]Shu Yu, Akihiko Ito, Rong Tu, Takashi Goto
313.Fabrication of Hydroxyapatite Film on Ti-29%Nb-13%Ta-4.6%Zr Using a MOCVD Technique.[Journal of Japan Institute of Light Metals,61(1),(2011),24-29]H. Tsutsumi, M. Niinomi, M. Nakai, T. Gozawa, T. Akahori, K. Saito, R. Tu and T. Goto
314.Highly (100)-oriented CeO2 films prepared on amorphous substrates by laser chemical vapor deposition.[Thin Solid Films,519(1),(2010),1-4]J.R. Vargas-Garcia, L. Romero, R. Tu, T. Goto
315.High-speed growth of YBa2Cu3O7-delta film with high critical temperature on MgO single crystal substrate by laser chemical vapor deposition.[Superconductor Science & Technology,23(12),(2010),125010-]P. Zhao, A. ITo, R. Tu, T. Goto
316.Fabrication of Hydroxyapatite Film on Ti-29Nb-13Ta-4.6Zr Using a MOCVD Technique.[Materials Transactions,51(12),(2010),2277-2283]H. Tsutsumi, M. Niinomi, M. Nakai, T. Gozawa, T. Akahori, K. Saito, R. Tu, T. Goto
317.Evaluation of Grain-Boundary Conduction of Dense AlN-SiC Solid Solution by Scanning Nonlinear Dielectric Microscopy.[Journal of the American Ceramic Society,93(12),(2010),4026-4029]R. Kobayashi, J. Tatami, J. Wakihara, K. Komeya, T. Meguro, R. Tu, T. Goto
318.Preparation of silicon oxycarbide films by laser ablation of SiO/3C-SiC multicomponent targets.[Applied Surface Science,257(5),(2010),1703-1706]C.B. Wang, T. Goto, R. Tu, L.M. Zhang
319.Preparation of Ca-Si-O films by chemical vapor deposition.[Surface and Coatings Technology,205(7),(2010),2618-2623]Shekhar Nath, Rong Tu, Takashi Goto
320.Calcium Phosphate Coating on Titanium Using Dry Process.[Materials Science Forum (IOP Publishing),654-656,(2010),2162-2167]T. Narushima, K. Ueda, T. Goto, J. Kurihara, H. Kawamura
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