Books, Original Papers & Review Papers- GOTO Takashi -
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[B]:Books [O]:Original Papers [R]:Review Papers
841.[O] CHEMICALLY VAPOR DEPOSITED Ti3SiC2.[Materials Research Bulletin,22(9),(1987),1195-1201]T. Goto, T. Hirai
842.[O] Microstructures of SiC-TiC in-situ composites prepared by chemical vapor deposition.[J. Jpn. Soc. Powd. and Powd. Metall.,34(9),(1987),487-490]T. Goto, T. Hirai
843.[O] High temperature evaporation characteristics of amorphous Si3N4-C composite prepared by chemical vapour deposition.[Journal of Materials Science,22(8),(1987),2842-2846]T. Goto, T. Hirai
844.[O] Thermodynamics for the chemical vapor deposition of SiCl4-TiCl4-CCl4-H2 system.[Journal of Chemical Society Japan,1987(11),(1987),1939-1945]T. Goto, T. Hirai
845.[O] Preparation of silicon carbide powders by chemical vapor deposition.[Proc. '87 Inter. Symp. Exhib. Sci. Tech. Sintering, Ed. by S. Somiya, M. Shimada, M. Yoshimura and R. Watanabe, Tokyo, 1987,1,(1987),49-54]L. Chen, T. Goto and T. Hirai
846.[O] Preparation of SiC-TiC in-situ composites by chemical vapor deposition.[Proc. 10th Inter. Conf. on Chemical Vapor Deposition, Ed. by G. W. Cullen, New Jersey, 1987,(1987),1070-1079]T. Goto, T. Hirai
847.[B] Tailoring Multiphase and Composite Ceramics.[Plenum Publishing Corporation,(1986)]T. Hirai, T. Goto
848.[R] Hybrid ceramics.[Polymer,35(4), (1986), 352-355]T. Hirai, T. Goto
849.[O] CVD-ceramic composites.[Proc. New Materials Japan, Osaka, 1986,(1986),231-243]T. Hirai, T. Goto
850.[O] Atomic arrangement of CVD amorphous (Si3N4) -B.[KENS Rep. IV,(1986),167-170]T. Fukunaga, T. Goto, M. Misawa, T. Hirai, K. Suzuki
851.[R] Synthesis of transparent ceramics by CVD method.[Industrial Materials,32(8), (1984), 1-8]T. Hirai, T. Goto
852.[O] Preparation of amorphous Si3N4-BN composites by chemical vapor deposition.[Mater. Sci. Res., "Emergent Process Methods for High-Technology Ceramics",17,(1984),347-358]T. Hirai, T. Goto and T. Sakai
853.[O] ESCA study of amorphous CVD Si3N4-C composites.[Journal of Materials Science Letters,2(12),(1983),805-807]T. GOTO, F. ITOH, K. SUSUZKI, T. HIRAI
854.[O] Preparation of silicon carbide by chemical vapor deposition.[Yogyo-Kyokai-Shi,91(11),(1983),502-509]T. Hirai, T. Goto, T. Kaji
855.[O] Etching of Chemically Vapour-Deposited Amorphous Si3N4-C Composites in HF Solution.[Journal of Materials Science,18(11),(1983),3387-3392]TAKASHI GOTO, TOSHIO HIRAI
856.[B] Preparation and electrical conductivity of amorphous CVD-3#DN#D#D4#D base composites.[Keiei System Inc.,(1983)]T. Hirai, T. Goto
857.[O] D. C. electrical conductivity of amorphous Si3N4-C composites prepared by chemical vapour deposition.[Journal of Materials Science,18(2),(1983),383-390]TAKASHI GOTO, TOSHIO HIRAI
858.[R] Preparation of non-oxide amorphous ceramics by CVD.[Ceramics Japan,17(4), (1982), 264-270]T. Hirai, T. Goto
859.[O] Density and deposition rates of amorphous CVD-Si3N4 including carbon.[Journal of Materials Science,16(10),(1981),2877-2882]TOSHIO HIRAI, TAKASHI GOTO
860.[O] Preparation of amorphous Si3N4-C plate by chemical vapour deposition.[Journal of Materials Science,16(1),(1981),17-23]TOSHIO HIRAI, TAKASHI GOTO
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