Books, Original Papers & Review Papers- GOTO Takashi -
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[B]:Books [O]:Original Papers [R]:Review Papers
361.[O] Calcium Phosphate Coating on Titanium Using Dry Process.[Materials Science Forum (IOP Publishing),654-656,(2010),2162-2167]T. Narushima, K. Ueda, T. Goto, J. Kurihara, H. Kawamura
362.[O] SiC-SiO2 nanocomposite films prepared by laser CVD using tetraethyl orthosilicate and acetylene as precursors.[Materials Letters,64(20),(2010),2151-2154]S. Yu, R. Tu, A. Ito, T. Goto
363.[O] A ramsayite-type oxide, Ca2Sn2Al2O9.[Acta Crystallogr Sect E Struct Rep Online,66(10),(2010),i72-i74]Hisanori Yamane, Shunsuke Abe, Rong Tu, Takashi Goto
364.[O] Preparation of Magneli phases of Ti27O52 and Ti6O11 films by laser chemical vapor deposition.[Thin Solid Films,518(23),(2010),6927-6932]R. Tu, G.S. Huo, T. Kimura, T. Goto
365.[O] Influence of laser power on the orientation and microstructure of CeO2 films deposited onHastelloy C276 tapes by laser chemical vapor deposition.[Applied Surface Science,256(21),(2010),6395-6398]P. Zhao, A. Ito, R. Tu, T. Goto
366.[O] Preparation of multiferroic Bi-0.85 Nd-0.15 FeO3 thin films by sol-gel method.[Acta Physica Sinica,29(8),(2010),5772-5776]D.Y. Guo, C. Li, C.B. Wang, Q. Shen, L.M. Zhang, R. T, T. Goto
367.[O] Preparation of highly (100)-oriented CeO2 films on polycrystalline Al2O3 substrates by laser chemical vapor deposition.[Surface & Coatings Technology,204(21-22),(2010),3619-3622]Pei Zhao, Akihiko Ito, Rong Tu, Takashi Goto
368.[O] Phase Formation and Solidification Routes Near Mo-Mo5SiB2 Eutectic Point in Mo-Si-B System.[Materials Transactions,51(9),(2010),1699-1704]Seong-Ho Ha, Kyousuke Yoshimi, Kouichi Maruyama, Rong Tu and Takashi Goto
369.[O] High-speed deposition of Y-Si-O films by laser chemical vapor deposition using Nd:YAG laser.[Surface and Coatings Technology,204(23),(2010),3846-3850]Akihiko Ito, Jun Endo, Teiichi Kimura, Takashi Goto
370.[O] Laser chemical vapor deposition of SiC films with CO2 laser.[Journal of Alloys and Compounds,502(1),(2010),238-242]K. Fujie, A. Ito, R. Tu, T. Goto
371.[O] Preparation of Ni-precipitated hBN powder by rotary chemical vapor deposition and its consolidation by spark plasma sintering.[Journal of Alloys and Compounds,502(2),(2010),371-375]J.F. Zhang, R. Tu, T. Goto
372.[O] Effect of annealing temperature on multiferroic properties of Bi0.85Nd0.15FeO3 thin films prepared by sol-gel method.[Science China-Technological Sciences,53(6),(2010),1572-1575]D.Y. Guo, C. Li, C.B. Wang, Q. Shen, L.M. Zhang, R. Tu, T. Goto
373.[R] 熱およびレーザーCVDによる高速コーティング.[The Materials Process Technology Center SOKEIZAI,51(6), (2010), 20-25]後藤 孝
374.[O] Enhancement of octacalcium phosphate deposition on a titanium surface activated by electron cyclotron resonance plasma oxidation.[Journal of Biomedical Materials Research Part B: Applied Biomaterials,93B(2),(2010),476-483]Yusuke Orii, Hiroshi Masumoto, Yoshitomo Honda, Takahisa Anada,Takashi Goto, Keiichi Sasaki, Osamu Suzuki
375.[O] Orientation control of α-Al2O3 films prepared by laser chemical vapor deposition using a diode laser.[Journal of Ceramic Society of Japan,118(5),(2010),366-369]Yu YOU, Akihiko Ito, Rong TU, Takashi GOTO
376.[O] High-speed Deposition of Oriented TiNx Films by Laser Metal-organic Chemical Vapor Deposition.[Journal of Inorganic Materials,25(4),(2010),391-395]Y.S. Gong, R. Tu, T. Goto
377.[O] Low-temperature deposition of α-Al2O3 films by laser chemical vapor deposition using a diode laser.[Applied Surface Science,256(12),(2010),3906-3911]Yu You, Akihiko Ito, Rong Tu, Takashi Goto
378.[O] Moderate temperature and high-speed synthesis of α-Al2O3 films by laser chemical vapor deposition using Nd:YAG laser.[Surface and Coatings Technology,204(14),(2010),2302-2306]Hokuto Kadokura, Akihiko Ito, Teiichi Kimura, Takashi Goto
379.[O] Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system.[Surface and Coatings Technology,204(14),(2010),2111-2117]Yansheng Gong, Rong Tu, Takashi Goto
380.[O] Amorphous-like nanocrystalline γ-Al2O3 films prepared by MOCVD.[Surface and Coatings Technology,204(14),(2010),2170-2174]Akihiko Ito, Rong Tu, Takashi Goto
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